A Self-aligned Gate Definition Process with Submicron Gaps
Dublin Core
Title
A Self-aligned Gate Definition Process with Submicron Gaps
Subject
This article discusses how self-aligned gate technology works.
Description
This article delves into self-aligned gate technology, which was crucial in the development of the Intel 4004.
Creator
Warmerdam, Aarnink, Hollerman, and Wallinga
Source
Institution of Electrical and Electronics Engineers
Publisher
Institution of Electrical and Electronics Engineers
Date
September 11-14, 1989
Citation
Warmerdam, Aarnink, Hollerman, and Wallinga, “A Self-aligned Gate Definition Process with Submicron Gaps,” Archive of the Present, accessed March 17, 2025, https://strundle.createunl.com/omeka/items/show/104.